With the development of science and technology, various application fields such as big data, cloud computing, Internet of Things, artificial intelligence, and consumer electronics have placed higher demands on chip performance, driving the advancement of process miniaturization and three-dimensional structures, resulting in a significant rise in the number of process steps. Consequently, the semiconductor industry continues to enhance its processes and technological capabilities to meet these ever-growing demands. Simultaneously, the application of optical technology in the pan-semiconductor processing field is progressively expanding, offering the potential for increased production efficiency and superior product quality in semiconductor manufacturing.

Within this context, Deep Ultraviolet (DUV) and Extreme Ultraviolet (EUV) lithography technologies have garnered considerable attention within the industry. These advanced optical technologies not only play an important role in lithography processing, but also involve many other optical applications. For example, critical size (CD) measurement, process overlay measurement, mask detection, process sensing, etc. In the future, we anticipate further expansion of optical technologies that can push the boundaries of semiconductor manufacturing, fostering greater innovation and transformative outcomes for the industry.

March 7, 2024, the “Optical Technologies and Applications in Pan-Semiconductor Processing Forum ” will bring together prominent companies and experts in the field of semiconductor optics to share specialized presentations from market, technology, and application perspectives. The forum will delve into topics such as the development of advanced lithography processes and equipment,